Multiple Arc Ion Plating Vacuum Chamber and Supporting System

Multiple Arc Ion Plating Vacuum Chamber and Supporting System

PlasmaRing-1 Multiple Arc Ion Plating Deposition System

PlasmaRing-1 Multiple Arc Ion Plating Deposition System

PlasmaRing-2 Multiple Arc Ion Plating Deposition System

PlasmaRing-2 Multiple Arc Ion Plating Deposition System

Product Features

  • Multi-arc ion coating equipment has properties of fast deposition, high ionization rate, and film with good adhesion
  • Our company developed a new generation of arc source with permanent magnetic and electromagnetic composite, rotating transverse magnetic field enhanced in cooperation with foreign experts to optimize the work of cathode arc spot, reduce the deposition of large particles, high utilization of the target material, and comprehensive equipment significant increase in performance.
  • The equipment is suitable for sputtering Cr, Mo, Ti, Al, CrAl, CrB, CrMo, CrSi, TiAl, TiB, etc. and their nitride and carbide coatings, MCrAlY high temperature protective coating.

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